SEMICONDUCTOR AND DISPLAY

Multi-site AFM Technology

MEMS (micro-electro-mechanical systems)-based atomic force microscopes (AFMs) enable a new paradigm in semiconductor and display metrology. Each MEMS AFM device has on-chip 3-axis scanning and sensing in a compact 1 mm2 footprint. Multiple AFM devices can be operated in parallel, allowing full-wafer metrology with 100+ point AFM for the first time.

Capable of high throughput and high wafer coverage

100+ site AFM concept for semiconductor and display metrology

3D wafer metrology

Sub-nanoscale topography, CD and roughness measurement

Extreme resolution

Sub-angstrom sensitivity and single-digit nanometer lateral resolution

Direct measurement

Material-agnostic: no prior knowledge of sample or model required